Oxidative DNA damage in rats exposed to extremely low frequency electro magnetic fields.

Abstract

Extremely low frequency (ELF) electromagnetic field (EMF) is thought to prolong the life of free radicals and can act as a promoter or co-promoter of cancer. 8-hydroxy-2'-deoxyguanosine (8OHdG) is one of the predominant forms of radical-induced lesions to DNA and is a potential tool to asses the cancer risk. We examined the effects of extremely low frequency electro magnetic field (ELF-EMF) (50 Hz, 0.97 mT) on 8OHdG levels in DNA and thiobarbituric acid reactive substances (TBARS) in plasma. To examine the possible time-dependent changes resulting from magnetic field, 8OHdG and TBARS were quantitated at 50 and 100 days. Our results showed that the exposure to ELF-EMF induced oxidative DNA damage and lipid peroxidation (LPO). The 8OHdG levels of exposed group (4.39+/-0.88 and 5.29+/-1.16 8OHdG/dG.10(5), respectively) were significantly higher than sham group at 50 and 100 days (3.02+/-0.63 and 3.46+/-0.38 8OHdG/dG.10(5)) (p<0.001, p<0.001). The higher TBARS levels were also detected in the exposure group both on 50 and 100 days (p<0.001, p<0.001). In addition, the extent of DNA damage and LPO would depend on the exposure time (p<0.05 and p<0.05). Our data may have important implications for the long-term exposure to ELF-EMF which may cause oxidative DNA damage.

AI evidence extraction

Main findings

Rats exposed to ELF-EMF (50 Hz, 0.97 mT) had significantly higher 8OHdG levels in DNA than sham controls at both 50 and 100 days (p<0.001 for both). Plasma TBARS levels were also higher in the exposed group at both time points (p<0.001), and the extent of DNA damage and lipid peroxidation was reported to depend on exposure time (p<0.05).

Outcomes measured

• 8-hydroxy-2'-deoxyguanosine (8OHdG) levels in DNA
• Thiobarbituric acid reactive substances (TBARS) in plasma
• Oxidative DNA damage
• Lipid peroxidation (LPO)

Limitations

• Sample size not reported in the provided abstract/metadata
• Exposure source/setup details not described in the provided abstract
• Only oxidative stress biomarkers reported; no clinical or tumor outcomes reported

Suggested hubs

• occupational-exposure (0.25)
  Study involves long-term ELF magnetic field exposure (50 Hz), relevant to contexts where such fields occur, though no specific occupational setting is described.

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    "study_type": "animal",
    "exposure": {
        "band": "ELF",
        "source": null,
        "frequency_mhz": null,
        "sar_wkg": null,
        "duration": "50 and 100 days"
    },
    "population": "Rats",
    "sample_size": null,
    "outcomes": [
        "8-hydroxy-2'-deoxyguanosine (8OHdG) levels in DNA",
        "Thiobarbituric acid reactive substances (TBARS) in plasma",
        "Oxidative DNA damage",
        "Lipid peroxidation (LPO)"
    ],
    "main_findings": "Rats exposed to ELF-EMF (50 Hz, 0.97 mT) had significantly higher 8OHdG levels in DNA than sham controls at both 50 and 100 days (p<0.001 for both). Plasma TBARS levels were also higher in the exposed group at both time points (p<0.001), and the extent of DNA damage and lipid peroxidation was reported to depend on exposure time (p<0.05).",
    "effect_direction": "harm",
    "limitations": [
        "Sample size not reported in the provided abstract/metadata",
        "Exposure source/setup details not described in the provided abstract",
        "Only oxidative stress biomarkers reported; no clinical or tumor outcomes reported"
    ],
    "evidence_strength": "low",
    "confidence": 0.7800000000000000266453525910037569701671600341796875,
    "peer_reviewed_likely": "yes",
    "keywords": [
        "ELF-EMF",
        "50 Hz",
        "0.97 mT",
        "rats",
        "8OHdG",
        "TBARS",
        "oxidative DNA damage",
        "lipid peroxidation"
    ],
    "suggested_hubs": [
        {
            "slug": "occupational-exposure",
            "weight": 0.25,
            "reason": "Study involves long-term ELF magnetic field exposure (50 Hz), relevant to contexts where such fields occur, though no specific occupational setting is described."
        }
    ]
}

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